Hafnium silicide, a form of transitional metal silicide, and a class of refractory intermediatemetallic compounds is one example. A unique combination of chemical and physical properties makes hafnium silicide a highly effective choice in fields such as bulk structural components and semiconductor components made of complement metal oxides.
Hafnium-disilicide Nanomaterials exhibit special electrical and optical properties and can even be applied in the field catalysis.
What does Hafnium disilicide HfSi2 do?
1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating
A new high temperature composite made with carbon fiber reinforced carbon (Chand C), which uses carbon fibre as reinforcement and pyrolyticcarbon as the matrix, is called carbon fiber reinforced carbon. The composite’s excellent properties at high temperatures, ablation resistance, good friction and wear characteristics led to research by the United States on Chammer C. This resulted in the creation of Cmax C from heat-proof and cauterized materials. C/C composite is a thermal structure material that can be used for components in gas turbine engines as well as spacecraft nose cone caps and leading edges. Many of these parts are designed to work under high temperatures and in oxidation conditions.
CPAC composites, however, are very easy to oxidize. They will usually not function normally in an atmosphere of 400F or higher. Chammer C composites need to be properly protected from oxidation. The preparation of an anti-oxidation coat is the best protection. This study shows that C / C composites have a higher ablation rate when additional refractory materials Zr (Hf), Ta, TiB2 or other refractory metallics are added. To understand the influence of metal Hf.Ta on Chand C composites’ ablation performance, SiC–HfSi2-TaSi2 anti ablation coating was created by embedding. The ablation performance was determined by an oxyacetylene laser ablation device. Knot.
2. For the preparation of organic light-emitting gadgets
Package cover covers the light emitting layer as well as the cathode of the anode. The package cover also includes a silicon carbitride coating and a barrier layer on top. Silicide and metal dioxides are used as the material for the barrier. They can include tantalum silicide (chromium), tantalum silicide (hafnium), titanium silicide (tungsten) and molybdenum silicide (tungsten). The metal oxide is chosen from aluminum trioxide magnesium oxide zirconium oxide hafnium dioxide, tantalum pentoxide, zirconium dioxide, hafnium bioxide, tantalum dioxide, tantalum dioxide, zirconium dioxide, hafnium oxide, tantalum dioxide, hafnium oxide, tantalum dioxide, hafnium oxide, and tantalum dioxide This organic light-emitting device has a shorter life expectancy.
3. It is possible to prepare thermoelectric components based on silicon-germanium alloy
An electrode layer is formed by a silicon/germanium alloy-based silicon thermoelectric element. A silicon/germanium layer-based silicon thermoelectric layer forms the barrier layer. The barrier layer is made up of silicide, silicon nitride, and a mix thereof. Silicide must contain at least one from the following: molybdenum silicide; tungsten silicide; cobalt silicide; nickel silicide; zirconium silicide. Tantalum silicide. The silicon-germanium-based thermoelectric element’s interface is strong bonded. It is resistant to cracks and diffusion phenomena, can withstand high-temperature accelerated testing for long periods, and has good thermal contact.
4. For preparing the cermet composite coated with high temperature and oxidation resistance
Refractory metal, intermetallic compound and refractory carbid are the main components of this composite film. The coating’s thickness is between 10 and 50 millimeters. A refractory element is one of five elements: molybdenum or tantalum; zirconium or zirconium; and silicon carbide. Intermetallic compounds are one or several of the following: molybdenum and tantalum silicides; tantalum silicides; zirconium carosilicides; hafnium or hafnium silicides; and tantalum silicides. The coating’s crystal structure is made up of either amorphous or polycrystalline microparticles.
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Hafnium Silicide HfSi2 Pulver
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